Study of Exfoliated Molybdenum Disulfide (MoS2)

Abstract

In this study, We demonstrate mono and few layers MoS₂ samples on the SiO₂ (270nm)/Si substrate from bulk MoS₂ crystal by micromechanical exfoliation technique. We also report that the Raman and PL intensity can be thermally modulated by annealing 1L, 2L and 7LMoS₂ in a vacuum or air. We have systematically studied Atomic Force Microscopy, Raman and PL properties of mono and few layer MoS₂ on the SiO₂  (270nm)/Si substrate. First, we find that the number of layer values dependent the Raman and PL emission. First, Raman intensity area ratio of the MoS₂ E¹₂g, Ag¹ and 2LA modes to that area of the Si substrate increased linear with increasing number of layers MoS₂. Second, Normalized PL intensity area of the (A) peak decreased linear with increasing number of layers MoS₂. The value of those graphs is a method to understand the number of layers the exfoliated MoS₂. Third we found that some effects of the few layers MoS₂after thermal annealed (vacuum and air 3000C for 40 min).